H2O MW 18.02 FP 0.0°C BP 100.0°C d 1.00 CAS [7732-18-5]
Residue <0.0005%
Resistivity (at time of manufacture) >18 MOhm @ 25°C
pH (at time of manufacture) 5.5-8.0 @ 25°C
TOC (at time of manufacture) <50 ppb
Application: High purity process solvent for preparative HPLC